A reticle (stepper field) is the group of dies exposed in one lithography step. Pass reticleConfig to buildWaferMap to generate field boundary geometry, then pass reticles to renderWaferMap to draw the overlay. analyzeWaferMap with enableReticlePositionAnalysis: true detects systematic defects at the same position within every field. Toggle the overlay on/off above, or switch to Value mode to see the parametric spatial pattern. The findings panel (open on the right) shows any detected reticle-position findings.